Semiconductor device having a registration mark for use in an exposure technique for micro-fine working
US4356223A · kind A · utility
33Cited by
7References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 23, 1981 |
| Grant date | Oct 26, 1982 |
| Priority date | — |
| Expiry date | Feb 23, 2001 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24479
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A registration mark to be used for a micro-fine working technique such as LSI's includes a smaller protrusion pattern within a larger recess pattern formed in a surface of the semiconductor substrate. The recess and protrusion patterns are used for coarse and fine positioning, respectively. The protrusion pattern implements precise positioning because it is isolated from other regions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.