Yasuo Iida
5Patents
5h-index
10Co-inventors
60Inventor score
Filing activity: Oct 19, 1977 → Jun 4, 2001
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5317063A | Water-soluble polymer sensitive to salt | Chemistry; Metallurgy | 96 | Expired |
| US4356223A | Semiconductor device having a registration mark for use in an exposure technique for micro-fine working | Emerging Cross-Sectional Technologies | 33 | Expired |
| US6727508B1 | Method and apparatus for irradiating active energy ray | Performing Operations; Transporting | 15 | Expired |
| US4152601A | X-ray lithography mask and method for manufacturing the same | Physics | 13 | Expired |
| US4690882A | Positive acting resist material comprised of novoloc resin derived from phenylphenol | Physics | 9 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.