Spatial period division exposing
US4360586A · kind A · utility
69Cited by
1References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 14, 1980 |
| Grant date | Nov 23, 1982 |
| Priority date | — |
| Expiry date | Apr 14, 2000 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2039
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Soft carbon-K X-rays (38) expose a PMMA photoresist (31) on an oxide layer (32) of a silicon substrate (33) through a parent mask (30) separated a distance S from the resist by a spacer (34) with the parent mask slits (12, 17) defining a spatial period p to establish an intensity pattern of period p/n at the photomask with S=p.sup.2 /n.lambda., where .lambda. is the wavelength of the incident radiation and .lambda.<p.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.