Photosensitive element containing UV sensitive terpolymers
US4382120A · kind A · utility
2Cited by
3References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 10, 1982 |
| Grant date | May 3, 1983 |
| Priority date | — |
| Expiry date | Feb 10, 2002 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/91
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photolithographic resist with excellent sensitivity for actinic radiation in the short wavelength ultraviolet region is produced from terpolymers of (1) methyl methacrylate, (2) materials such as 3-oximino-2-butanone methacrylate, and (3) compounds such as methacrylonitrile.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.