Patent · US Expired

Polyimide, polyisoindoloquinazoline dione, polyoxazine dione and polyquinazoline dione precursor stages and the manufacture

US4385165A · kind A · utility

15Cited by
3References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 19, 1980
Grant dateMay 24, 1983
Priority date
Expiry dateAug 19, 2000

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08L79/04
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

The present invention relates to oligomeric and/or polymeric radiation-reactive precursor stages of polyimides, polyisoindoloquinazoline diones, polyoxazine diones and polyquinazoline diones as well as to a method for the preparation of these radiation-reactive precursor stages. The invention provides addition products of olefinically unsaturated monoepoxides on carboxyl group-containing polyaddition products of aromatic and/or heterocyclic tetracarboxylic-acid dianhydrides and diamino compounds or diamino compounds with at least one ortho-position amido group, or on carboxyl group-containing polyaddition products of aromatic and/or heterocyclic dihdyroxy dicarboxylic acids or corresponding diaminodicarboxylic acids and diisocyanates. The radiation-reactive precursor stages according to the invention are suitable, for example, for the manufacture of highly heat-resistant relief structures.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.