Microwave plasma ion source
US4393333A · kind A · utility
26Cited by
8References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 10, 1980 |
| Grant date | Jul 12, 1983 |
| Priority date | — |
| Expiry date | Dec 10, 2000 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J27/18
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A microwave plasma ion source according to the present invention is designed such that a microwave electric field and a magnetic field are applied to a discharge gas introduced into a discharge region, to form plasma, from which ions are extracted. The above magnetic field is formed by means of an electromagnet provided on the low-voltage side of ion extraction electrodes and a high-permeability member provided in that section which is on the side of a waveguide and which permits the microwaves to be propagated freely.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.