Spectroscopic monitoring of gas-solid processes
US4394237A · kind A · utility
23Cited by
11References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 17, 1981 |
| Grant date | Jul 19, 1983 |
| Priority date | — |
| Expiry date | Jul 17, 2001 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23F4/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for accurately monitoring and adjusting gas phase processes such as gas etching and chemical vapor deposition has been found. This method relies on the use of induced fluorescence. The gaseous phase used in the process to be monitored is probed by excitation with a suitable energy source. The emission from the gas phase induced through this excitation is then monitored and yields an accurate measure of concentration of the active species present. In turn the conditions of the fabrication process are adjusted based on these discerned concentrations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.