Process of making semiconductor devices using photosensitive bodies
US4400461A · kind A · utility
12Cited by
4References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 22, 1981 |
| Grant date | Aug 23, 1983 |
| Priority date | — |
| Expiry date | May 22, 2001 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o-nitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.