Photoresist composition
US4407927A · kind A · utility
13Cited by
2References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 3, 1982 |
| Grant date | Oct 4, 1983 |
| Priority date | — |
| Expiry date | Jun 3, 2002 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/901
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene homopolymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution can be obtained even when a base board having a surface of a high reflectance is used, with a high reproducibility and without being affected by prebaking conditions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.