Pattern data handling system for an electron beam exposure system
US4433384A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 5, 1981 |
| Grant date | Feb 21, 1984 |
| Priority date | — |
| Expiry date | Oct 5, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3026
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A pattern data handling system for an electron beam exposure system wherein figure data conversion is performed simultaneously with irradiation of a workpiece, thereby providing high speed operation. Figure data, containing figure descriptions for a stripe area, is subdivided into blocks of segment figure data and is stored in a pattern data memory. Multiple pattern generators, each including a bit map memory, simultaneously convert blocks of segment figure data to bit maps and store the bit maps in their respective bit map memories. The bit maps are transferred out of the bit map memories and through a shift register one at a time to provide continuous beam blanking data. The system is particularly useful for electron beam exposure of reticles which are characterized by little or no repetition of features and by relatively large features.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.