Fluidized bed silicon deposition from silane
US4444811A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 1981 |
| Grant date | Apr 24, 1984 |
| Priority date | — |
| Expiry date | Dec 3, 2001 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B33/03
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A process and apparatus for thermally decomposing silicon containing gas for deposition on fluidized nucleating silicon seed particles is disclosed. Silicon seed particles are produced in a secondary fluidized reactor by thermal decomposition of a silicon containing gas. The thermally produced silicon seed particles are then introduced into a primary fluidized bed reactor to form a fludized bed. Silicon containing gas is introduced into the primary reactor where it is thermally decomposed and deposited on the fluidized silicon seed particles. Silicon seed particles having the desired amount of thermally decomposed silicon product thereon are removed from the primary fluidized reactor as ultra pure silicon product. An apparatus for carrying out this process is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.