Method and apparatus for evaporating material under vacuum using both an arc discharge and electron beam
US4448802A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 12, 1982 |
| Grant date | May 15, 1984 |
| Priority date | — |
| Expiry date | Mar 12, 2002 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3053
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of evaporating an evaporative substance under vacuum comprises bombarding the evaporative substance with electrons from a low voltage arc discharge established between a cathode and an anode which is located in an evaporation chamber and simultaneously supplying additional power for evaporation to the evaporative substance by means of an electron gun which produces an electron energy in excess of one keV. A device for carrying out the invention comprises an evacuable bowl, an evaporation chamber with a receptacle therein for a substance to be evaporated and means for establishing a low voltage arc discharge between a cathode and an anode located in the evaporation chamber, a further provision of an electron gun for bombarding the substance with electrons which has an electron energy more than one kilovolt.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.