Process for making an imaged oxygen-reactive ion etch barrier
US4464460A · kind A · utility
24Cited by
3References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 28, 1983 |
| Grant date | Aug 7, 1984 |
| Priority date | — |
| Expiry date | Jun 28, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0754
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for making an image oxygen-reactive ion etch barrier using a polysilane that is resistant to resistive ion etching and is also a positive acting resist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.