Exposure apparatus for production of integrated circuit
US4465368A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 30, 1981 |
| Grant date | Aug 14, 1984 |
| Priority date | — |
| Expiry date | Dec 30, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/30
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An exposure apparatus for production of ICs of the type that includes a stage on which is placed a semiconductor wafer to be exposed by illumination light projecting means, and means for two-dimensionally moving the stage within a plane intersecting the illumination light at substantially right angles. The improvement comprises illumination detection means provided with a photo reception surface, and means for mounting the illumination detection means on the stage in such a manner that the photo reception surface and the surface of the semiconductor wafer on the stage to be exposed are at substantially equal height relative to the stage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.