Patent assignee · COMPANY

Nippon Kogaku K.K.

852Patents
0Active
852Granted
45Portfolio score

Filing activity: Feb 22, 1973 → Nov 19, 1993

Most-cited patents

PatentTitleAreaCited byStatus
US4780617A Method for successive alignment of chip patterns on a substrate Physics 401 Expired
US4465368A Exposure apparatus for production of integrated circuit Electricity 300 Expired
US4652090A Dispersed iridium based complementary electrochromic device Physics 201 Expired
US4782239A Optical position measuring apparatus Physics 198 Expired
US4456931A Electronic camera Emerging Cross-Sectional Technologies 194 Expired
US4619508A Illumination optical arrangement Physics 174 Expired
US4420773A Electronic photographic camera Emerging Cross-Sectional Technologies 166 Expired
US4650983A Focusing apparatus for projection optical system Physics 152 Expired
US4758883A Electronic picture camera with reduced memory capacity Electricity 147 Expired
US4497015A Light illumination device Mechanical Engineering; Lighting; Heating 142 Expired
US4630182A Illuminating system Mechanical Engineering; Lighting; Heating 137 Expired
US4338001A Telephoto lens system Physics 121 Expired
US4558949A Horizontal position detecting device Physics 114 Expired
US4780747A Projection exposure apparatus Physics 105 Expired
USD292985S Spectacles General 99 Expired
US4769750A Illumination optical system Physics 96 Expired
US4293194A Solid electrochromic element Electricity 93 Expired
US4710026A Position detection apparatus Physics 89 Expired
US4468120A Foreign substance inspecting apparatus Physics 86 Expired
US4721972A Camera having a photo-taking lens barrel movable in the direction of the optic axis Physics 85 Expired
US4769523A Laser processing apparatus Electricity 85 Expired
US4666273A Automatic magnification correcting system in a projection optical apparatus Physics 84 Expired
US4531060A Positioning method Physics 81 Expired
US4342905A Automatic focusing device of a microscope Physics 79 Expired
US4677301A Alignment apparatus Physics 77 Expired

Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.