Apparatus for thermal treatment of semiconductors
US4472622A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 24, 1980 |
| Grant date | Sep 18, 1984 |
| Priority date | — |
| Expiry date | Mar 24, 2000 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B31/12
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In an apparatus for thermal treatment of semiconductors in a treating gas, a treating tube has a heating portion, an extending portion, and a sealing portion, and convection-preventing plates are disposed within a treating tube, between one end of the heating portion and the sealing portion, so as to interrupt currents of the treating gas. A heating element is arranged so that the quantities of heat generated along the heating portion are largest near a gas-discharging end of the heating portion, intermediate near a gas-discharging end thereof, and smallest therebetween. The plates are mounted to the sealing portion so as to be inserted into the treating tube when the sealing portion is attached and so as to be withdrawn from the treating tube when the sealing portion is detached. The plates may be mounted integrally to the sealing portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.