Pattern exposing apparatus
US4477182A · kind A · utility
15Cited by
3References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 9, 1982 |
| Grant date | Oct 16, 1984 |
| Priority date | — |
| Expiry date | Jul 9, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70541
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pattern exposing apparatus comprising means for projecting a semiconductor device mask pattern onto the photoresist layer coated on a semiconductor substrate, and means for projecting an identification mark which is specific to each substrate onto a part of the photoresist layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.