Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4491628A · kind A · utility
643Cited by
12References
17Claims
0Family size
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Key dates
| Filing date | Aug 23, 1982 |
| Grant date | Jan 1, 1985 |
| Priority date | — |
| Expiry date | Aug 23, 2002 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Resists sensitive to UV, electron beam and X-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in polarity (solubility) together with a photoinitiator which generates acid upon radiolysis. A sensitizer component that alters wavelength sensitivity may also be added.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.