Dry-developed, negative working electron resist system
US4497891A · kind A · utility
3Cited by
7References
4Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 25, 1983 |
| Grant date | Feb 5, 1985 |
| Priority date | — |
| Expiry date | Oct 25, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for producing a resist pattern by dry development using a resist comprising from 70 to 50% by weight of a novolac resin and from 30 to 50% by weight of a poly(ether pentene sulfone).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.