Positive-working radiation-sensitive mixture
US4506003A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 14, 1983 |
| Grant date | Mar 19, 1985 |
| Priority date | — |
| Expiry date | Nov 14, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S522/904
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive-working radiation-sensitive mixture is described which is composed of a compound having at least one C--O--C bond which can be split by acid, a compound which forms a strong acid when irradiated, a binder which is insoluble in water and soluble in aqueous-alkaline solutions, and a resin having solubility properties which differ from those of the binder and which is selected from (1) a polyurethane resin obtained from an organic isocyanate and a polymer which contains hydroxyl groups, (2) a polyvinyl alkyl ether, (3) an alkyl acrylate polymer, or (4) a hydrogenated or partially hydrogenated derivative of colophony. As a result of the resin additives, photoresist layers are obtained which have good adhesion to the support, good flexibility, good latitude in developing and good resolution.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.