Hartmut Steppan
15Patents
8h-index
12Co-inventors
65Inventor score
Filing activity: Feb 26, 1974 → Sep 26, 1991
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4506003A | Positive-working radiation-sensitive mixture | Emerging Cross-Sectional Technologies | 32 | Expired |
| US4659645A | Photosensitive mixture and photosensitive recording material with diazonium salt polycondensation product and free radical radiation polymerizable composition | Physics | 20 | Expired |
| US4966828A | Carbonylmethylene-heterocyclic compounds containing trihalogenomethyl groups, process for their preparation, and light-sensitive mixture containing the compounds | Emerging Cross-Sectional Technologies | 18 | Expired |
| US5200299A | Quinoline and acridine compounds effective as photoinitiators and containing polymerizable (meth)acryloyl substituents | Emerging Cross-Sectional Technologies | 17 | Expired |
| US3985566A | Photosensitive crosslinkable 1-carbonyloxy-1H-naphthalene-2-one polymers and process for their preparation | Emerging Cross-Sectional Technologies | 15 | Expired |
| US3969323A | Photo-crosslinkable 2-pyrone polymers and processes for the manufacture thereof | Emerging Cross-Sectional Technologies | 13 | Expired |
| US4776892A | Process for stripping light-hardened photoresist layers | Physics | 11 | Expired |
| US4401520A | Process for the preparation of screen printing stencils by an electroplating method | Physics | 10 | Expired |
| US4956264A | Radiation-polymerizable mixture | Emerging Cross-Sectional Technologies | 7 | Expired |
| US5217845A | Photopolymerizable mixture and photopolymerizable copying material containing same | Emerging Cross-Sectional Technologies | 7 | Expired |
| US4021243A | Diazo light-sensitive copying composition and process of using in the manufacture of screen printing stencils | Physics | 7 | Expired |
| US4492748A | Light-sensitive polycondensation product containing diazonium and dialdehyde groups, and light-sensitive recording material prepared therewith | Physics | 4 | Expired |
| US5162190A | 1,2-naphthoquinone-2-diazide-sulfonic acid amides and photosensitive compositions containing these compounds | Physics | 4 | Expired |
| US4661432A | Light-sensitive, diazonium group-containing polycondensation product, process for its production, and light-sensitive recording material containing this polycondensation product | Chemistry; Metallurgy | 4 | Expired |
| US4159202A | Photopolymer having 2-pyridone side group | Chemistry; Metallurgy | 3 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.