Method of catalytic etching
US4506005A · kind A · utility
10Cited by
9References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 10, 1983 |
| Grant date | Mar 19, 1985 |
| Priority date | — |
| Expiry date | May 10, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/95
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Catalytic etching is carried out by placing a pattern of a catalyst on a surface to be selectively etched and treating the imaged surface with an activated fluid which consumes the material being etched. In one embodiment a surface such as a chalcogenide is provided with a silver or other metal pattern corresponding to a semiconductor pattern and the chalcogenide is etched with an oxygen containing plasma reactive with the chalcogenide, the reaction being increased by the silver to provide a positive resist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.