Patent · US Expired

Electro-magnetic alignment apparatus

US4506205A · kind A · utility

64Cited by
3References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 10, 1983
Grant dateMar 19, 1985
Priority date
Expiry dateJun 10, 2003

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/70716
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

This invention is directed to electromagnetic alignment apparatus, which is particularly adapted, among many other possible uses, for use in aligning the wafers in a microlithography system, said apparatus comprising in combination three or more spaced magnets, three or more coil assemblies mounted to pass through the magnetic fields of the magnets respectively, means for controlling the flow of current through the coil assemblies respectively, said coil assemblies being joined together to form a structure movable with respect to the magnets and adapted to carry an object thereon, the coil assemblies being wound with respect to each other so that by controlling the supply of current to the coils the structure can be moved selectively in three degrees of freedom.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.