Daniel N. Galburt
53Patents
14h-index
46Co-inventors
84Inventor score
Filing activity: Jun 10, 1983 → Jul 13, 2017
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US4952858A | Microlithographic apparatus | Electricity | 112 | Expired |
| US4506205A | Electro-magnetic alignment apparatus | Physics | 64 | Expired |
| US5285142A | Wafer stage with reference surface | Electricity | 61 | Expired |
| US4506204A | Electro-magnetic apparatus | Electricity | 57 | Expired |
| US4907035A | Universal edged-based wafer alignment apparatus | Physics | 40 | Expired |
| US6013401A | Method of controlling illumination field to reduce line width variation | Physics | 33 | Expired |
| US6760167B2 | Apparatus, system, and method for precision positioning and alignment of a lens in an optical system | Physics | 26 | Expired |
| US6538720B2 | Lithographic tool with dual isolation system and method for configuring the same | Physics | 23 | Expired |
| US6097474A | Dynamically adjustable high resolution adjustable slit | Physics | 22 | Expired |
| US6556364B2 | Apparatus, system, and method for precision positioning and alignment of a lens in an optical system | Physics | 22 | Expired |
| US6912043B2 | Removable reticle window and support frame using magnetic force | Physics | 20 | Expired |
| US6307619A | Scanning framing blade apparatus | Electricity | 19 | Expired |
| US5966216A | On-axix mask and wafer alignment system | Physics | 15 | Expired |
| US5352962A | Brushless polyphase reduced force variation motor | Electricity | 14 | Expired |
| US6906789B2 | Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion | Electricity | 14 | Expired |
| US4933714A | Apparatus and method for reproducing a pattern in an annular area | Physics | 14 | Expired |
| US6853440B1 | Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination | Physics | 13 | Expired |
| US7053990B2 | System to increase throughput in a dual substrate stage double exposure lithography system | Physics | 12 | Expired |
| US7010958B2 | High-resolution gas gauge proximity sensor | Physics | 10 | Expired |
| US7292308B2 | System and method for patterning a flexible substrate in a lithography tool | Electricity | 9 | Expired |
| US6784978B2 | Method, system, and apparatus for management of reaction loads in a lithography system | Physics | 9 | Expired |
| US7134321B2 | Fluid gauge proximity sensor and method of operating same using a modulated fluid flow | Physics | 8 | Expired |
| US6876439B2 | Method to increase throughput in a dual substrate stage double exposure lithography system | Physics | 8 | Expired |
| US6885435B2 | Method, system, and apparatus for management of reaction loads in a lithography system | Physics | 6 | Expired |
| US7437911B2 | Method and system for operating an air gauge at programmable or constant standoff | Physics | 5 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.