Method of electro-coating a semiconductor device
US4507181A · kind A · utility
119Cited by
8References
32Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 17, 1984 |
| Grant date | Mar 26, 1985 |
| Priority date | — |
| Expiry date | Feb 17, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D7/126
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A non-destructive method of electro-coating a preselected pattern of electrically insulating or conducting material onto a semiconductor device which includes a photoresponsive junction. The method includes the step of illuminating the semiconductor device prior to initiating the flowing of electro-coating current therethrough. The method has particular utility in providing electroplated grid patterns and connections on large area photovoltaic cells. Also disclosed is the use of current generated by a photovoltaic cell to effect the electro-coating thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.