Deposition of compounds from multi-component organo-metals
US4524090A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Apr 30, 1984 |
| Grant date | Jun 18, 1985 |
| Priority date | — |
| Expiry date | Apr 30, 2004 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/306
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of preparing films having the formula A.sup.IIB B.sup.VIA wherein A.sup.IIB is a group IIB metal and B.sup.VIA is a chalcogenide by the photolysis or low temperature thermolysis of an organo-metallic compound containing the targeted A.sup.IIB B.sup.VIA elements is provided. Organo-metallic compounds utilized in the method are of the general formulas R-X-M-X-R', R-M-X-M-R', R-M-X-R', R-M-CH.sub.2 -X-R', R-M-X-X-R' wherein R and R' are hydrogen, an alkyl, an aryl or an organic radical containing a heteroatom, M is a group IIB metal and X is a chalcogenide. Photolysis is carried out with an ultraviolet, visible or infrared light source. The films are useful in the manufacture of semiconductor elements and optical coatings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.