Point source X-ray focusing device
US4525853A · kind A · utility
39Cited by
11References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 17, 1983 |
| Grant date | Jun 25, 1985 |
| Priority date | — |
| Expiry date | Oct 17, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/064
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Point source X-ray focusing device structures, materials and methods of forming them are provided which exhibit a greatly increased total reflected intensity for a desired X-ray wavelength of interest. The devices include one or more focusing elements which each have a focusing surface with a plurality of layer pairs formed thereon. The focusing surface and the layer pairs are designed to collect, reflect and concentrate the maximum X-ray flux from a point source to a focus point for a particular wavelength of interest.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.