Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents
US4526856A · kind A · utility
17Cited by
5References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 23, 1983 |
| Grant date | Jul 2, 1985 |
| Priority date | — |
| Expiry date | May 23, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0048
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A novel photoresist formulation is provided which provides low striations and excellent wetting properties. The photoresist composition may be applied by spin casting on various substrates used in integrated circuit manufacture. The essential component in this invention is the solvent composition which consists of cyclopentanone (or cyclopentanone-cyclohexanone blend) in combination with an aliphatic alcohol of 5-12 carbon atoms. These solvent components when used in certain specific ratios provide unexpectedly good wetting of various substrates and low striation films.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.