Chemical vapor deposition apparatus
US4539933A · kind A · utility
31Cited by
9References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 31, 1983 |
| Grant date | Sep 10, 1985 |
| Priority date | — |
| Expiry date | Aug 31, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/826
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An improved chemical vapor deposition device having heating means substantially surrounding an inner deposition chamber for providing isothermal or precisely controlled gradient temperature conditions therein. The internal components of the chamber are quartz or similar radiant energy transparent material. Also included are special cooling means to protect thermally sensitive seals, structural configurations strengthening areas of glass components subjected to severe stress during operation, and specific designs permitting easy removal and replacement of all glass components exposed to deposition gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.