Effusion type evaporator cell for vacuum evaporators
US4543467A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 25, 1983 |
| Grant date | Sep 24, 1985 |
| Priority date | — |
| Expiry date | Oct 25, 2003 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/243
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Vapor sources for vacuum evaporators in which the evaporation rate has hitherto been adjusted by varying the temperature of the vessel containing the evaporative substances, have a very large time constant, and an approximately exponential control characteristic. The invention substantially reduces the time constant in an effusion evaporator cell by providing that the rate is adjusted by means of a mechanical slide, preferably of boron nitride or graphite, placed in front of the vapor escape aperture or apertures of the evaporator vessel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.