Electron beam exposure system
US4543512A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 8, 1981 |
| Grant date | Sep 24, 1985 |
| Priority date | — |
| Expiry date | Oct 8, 2001 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/304
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An electron beam exposure system has first and second apertures through which is passed an electron beam emitted from an electron gun. A rectangular image formed by superposition of the images formed by the first and second apertures is projected onto a target plane through a third aperture by condenser lenses and projection lenses. When a crossover of the electron beam drifts in the direction perpendicular to the axis of the lens system, the current of the electron beam projected on the target plate decreases. The electron beam current is detected by a faraday cup, and the locus of the electron beam is corrected by a coil assembly interposed between the second and third apertures so that the faraday cup may detect the maximum beam current.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.