Mamoru Nakasuji
134Patents
22h-index
46Co-inventors
90Inventor score
Filing activity: Jun 15, 1978 → Jun 30, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5892224A | Apparatus and methods for inspecting wafers and masks using multiple charged-particle beams | Electricity | 146 | Expired |
| US7109483B2 | Method for inspecting substrate, substrate inspecting system and electron beam apparatus | Electricity | 113 | Expired |
| US5831270A | Magnetic deflectors and charged-particle-beam lithography systems incorporating same | Electricity | 64 | Expired |
| US6855929B2 | Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former | Electricity | 60 | Expired |
| US6992290B2 | Electron beam inspection system and inspection method and method of manufacturing devices using the system | Electricity | 57 | Expired |
| US6593152B2 | Electron beam apparatus and method of manufacturing semiconductor device using the apparatus | Electricity | 56 | Expired |
| US6087046A | Methods for forming microlithographic masks that compensate for proximity effects | Physics | 53 | Expired |
| US5981947A | Apparatus for detecting or collecting secondary electrons, charged-particle beam exposure apparatus comprising same, and related methods | Electricity | 51 | Expired |
| US6140021A | Charged particle beam transfer method | Emerging Cross-Sectional Technologies | 50 | Expired |
| US7420164B2 | Objective lens, electron beam system and method of inspecting defect | Electricity | 46 | Active |
| US7244932B2 | Electron beam apparatus and device fabrication method using the electron beam apparatus | Electricity | 43 | Expired |
| US6087667A | Charged-particle-beam (CPB) lithography apparatus, evaluation method, and CPB source | Electricity | 43 | Expired |
| US6465783B1 | High-throughput specimen-inspection apparatus and methods utilizing multiple parallel charged particle beams and an array of multiple secondary-electron-detectors | Electricity | 43 | Expired |
| US6125522A | Manufacturing method for electrostatic deflector | Emerging Cross-Sectional Technologies | 41 | Expired |
| US5770863A | Charged particle beam projection apparatus | Electricity | 37 | Expired |
| US7135676B2 | Inspection system by charged particle beam and method of manufacturing devices using the system | Electricity | 34 | Expired |
| US7241993B2 | Inspection system by charged particle beam and method of manufacturing devices using the system | Electricity | 31 | Expired |
| US7601972B2 | Inspection system by charged particle beam and method of manufacturing devices using the system | Electricity | 31 | Active |
| US9368314B2 | Inspection system by charged particle beam and method of manufacturing devices using the system | Electricity | 28 | Active |
| US7049585B2 | Sheet beam-type testing apparatus | Electricity | 28 | Expired |
| US5747819A | Charged particle beam transfer device exhibiting low aberration | Electricity | 28 | Expired |
| US7095022B2 | Electron beam apparatus and method of manufacturing semiconductor device using the apparatus | Electricity | 24 | Expired |
| US5973333A | Charged-particle-beam pattern-transfer apparatus and methods | Electricity | 22 | Expired |
| US5751538A | Mask holding device and method for holding mask | Electricity | 21 | Expired |
| US4543512A | Electron beam exposure system | Electricity | 21 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.