Chemical vapor deposition apparatus
US4545327A · kind A · utility
69Cited by
7References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 27, 1982 |
| Grant date | Oct 8, 1985 |
| Priority date | — |
| Expiry date | Aug 27, 2002 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S505/826
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chemical vapor deposition device having uniformly distributed heating means substantially surrounding an inner deposition reaction chamber for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber spaced therefrom.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.