Process for forming a graded index optical material and structures formed thereby
US4545646A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Sep 2, 1983 |
| Grant date | Oct 8, 1985 |
| Priority date | — |
| Expiry date | Sep 2, 2003 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24736
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for depositing on the surface of a substrate a layer of a chosen material having continuous gradations in refractive index in a predetermined periodic pattern. The substrate is exposed to two vapor phase reactants which react upon radiation-inducement to produce the chosen material, and the relative proportion of the reactants is varied in a predetermined and continuous sequence to produce continuous gradations in the stoichiometric composition and refractive index of the deposited layer as a function of thickness. Additionally, predetermined changes in refractive index and/or thickness across the horizontal surface of the substrate may be produced in combination with the change in refractive index as a function of thickness. Diffraction optical elements formed by such a process include various optical filters and reflective optical coatings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.