Patent · US Expired

Chemical vapor deposition process

US4547404A · kind A · utility

5Cited by
7References
4Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 2, 1984
Grant dateOct 15, 1985
Priority date—
Expiry dateOct 2, 2004

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC23C16/481
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

A chemical vapor deposition device having uniformly distributed heating means substantially surrounding an inner deposition reaction chamber for providing isothermal or precisely controlled gradient temperature conditions therein, the reaction chamber being surrounded by the walls of an outer vacuum chamber spaced therefrom.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.