Process for preparing semiconductors using photosensitive bodies
US4551416A · kind A · utility
8Cited by
5References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 29, 1983 |
| Grant date | Nov 5, 1985 |
| Priority date | — |
| Expiry date | Apr 29, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
Photosensitive bodies that are sensitive to ultraviolet radiation and that exhibit excellent contrast are formed from base soluble polymers such as poly(methyl methacrylate-co-methacrylic acid) physically mixed with base insoluble materials such as o,o'-dinitrobenzyl esters. The base insoluble esters decompose upon irradiation to form base soluble entities in the irradiated regions. These irradiated portions are then soluble in basic solutions that are used to develop the desired image.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.