Radiation sensitive and oxygen plasma developable resist
US4552833A · kind A · utility
94Cited by
8References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 14, 1984 |
| Grant date | Nov 12, 1985 |
| Priority date | — |
| Expiry date | May 14, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A negative tone resist image is achieved by (1) coating a substrate with a film of a polymer containing a masked, reactive functionality; (2) imagewise exposing the film to radiation in a fashion such that the masked functionality is liberated; (3) contacting the film with an organometallic reagent; (4) developing the relief image by the oxygen plasma etching.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.