X-Y Stage for a patterned wafer automatic inspection system
US4556317A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 1984 |
| Grant date | Dec 3, 1985 |
| Priority date | — |
| Expiry date | Feb 22, 2004 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70716
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An automatic patterned wafer inspection system includes macro and micro inspection stations having optical axes that are 10 inches apart on an X-Y crossed roller stage which provides 7 inches of travel in each of two directions along two orthogonal axes. A macro-micro transport arm is pivotally interconnected with the stage and supports a turntable with a vacuum chuck centrally located thereon. The transport arm is positioned to move the wafer from a position 5 inches to the left of center of the stage (the macro axis) to a position 5 inches to the right of the center of the stage (the micro axis). Repeatability of positioning of the arms is obtained by using a spring-loaded link to drive the transport arm against a hard stop located at the left and right of the stage. The turntable is mounted so as to have an outside edge adjacent the distal end of the transport arm. A vacuum chuck for holding the wafer is attached to the turntable. A belt and pulley drive is used to rotate the turntable when it is necessary for the wafer alignment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.