Apparatus for nondestructively measuring characteristics of a semiconductor wafer with a junction
US4563642A · kind A · utility
23Cited by
2References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 5, 1982 |
| Grant date | Jan 7, 1986 |
| Priority date | — |
| Expiry date | Oct 5, 2002 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R31/2656
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
To nondestructively measure the carrier lifetime and cutoff frequency of a semiconductor wafer having a junction, the apparatus of this invention comprises means for radiating a pulsated photo beam whose frequency is changeable to the semiconductor wafer having a junction, means for taking out the resulting photovoltage by capacitance coupling and means for calculating the carrier lifetime and cutoff frequency from the chopping-frequency dependence characteristics of this photovoltage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.