Process and device for the ionic analysis of an insulating sample
US4564758A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Feb 1, 1984 |
| Grant date | Jan 14, 1986 |
| Priority date | — |
| Expiry date | Feb 1, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/026
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention provides a process and device for the ionic analysis of an insulating sample brought to a given negative potential, of the type in which a target on the surface of the sample to be analyzed is bombarded by means of a primary electron beam and negative ions emitted by the bombarded target are used for producing an ion image of the sample. An electron beam whose normal speed component cancels out just at level of the surface of the target is directed perpendicularly to the target. The device comprises for this purpose a filament, brought substantially to the same negative potential as the sample, which emits the electron beam. The electron beam, after emission, is deflected by a magnetic prism so as to be brought into coincidence with the optical axis of the negative ion beam emitted by the target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.