Troide plasma reactor with magnetic enhancement
US4572759A · kind A · utility
45Cited by
3References
27Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 26, 1984 |
| Grant date | Feb 25, 1986 |
| Priority date | — |
| Expiry date | Dec 26, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32137
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A triode apparatus with magnetic enhancement for dry processing semiconductor wafers and the like. A conductive substantially cylindrical chamber contains a cathode that is connected to a first source of AC power. A wafer stage mounted on the inside of the chamber wall is connected to a second source of AC power. The chamber has means for connection to a reference voltage potential. Means for generating a magnetic field perpendicular to the electric field generated between the chamber walls and the cathode is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.