Process for fabricating optical wave-guiding components and components made by the process
US4585299A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 19, 1983 |
| Grant date | Apr 29, 1986 |
| Priority date | — |
| Expiry date | Jul 19, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/1347
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Optical wave-guiding components and a process for fabricating such components in a substrate using conventional integrated circuit fabrication techniques. Ions of a suitable dopant are selectively implanted in a silicon substrate to create an interior region defining a wave-guiding region of a first index of refraction. A wave confining region surrounding the wave-guiding region is created by oxidizing the silicon substrate. The wave confining region has a index of refraction lower than that of the interior wave-guiding region defined by the implanted dopant. Various configurations of components, from which various optical component characteristics can be obtained, are disclosed. The optical components also may be combined with electronic circuit components formed on the same silicon substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.