Apparatus for ion implantation
US4587432A · kind A · utility
58Cited by
1References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 3, 1984 |
| Grant date | May 6, 1986 |
| Priority date | — |
| Expiry date | Aug 3, 2004 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3171
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ion implantation system in which surfaces of ion flight tube and drift tube perpendicular to ion dispersion plane have geometric configuration which precludes sputtering of contaminants onto path through resolving slit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.