Dose control apparatus
US4587433A · kind A · utility
48Cited by
4References
2Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 3, 1985 |
| Grant date | May 6, 1986 |
| Priority date | — |
| Expiry date | Apr 3, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3171
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus for measuring and compensating for neutral ions in an ion beam in the dose control system of an ion implanter. The gas pressure in the implantation volume (15) is measured, and the pressure signal is converted to an effective beam current signal in accordance with a known relationship among the gas pressure, the apparent beam current as measured by a Faraday cage and the neutral beam. The resulting effective beam current signal is inputted to the dose control system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.