Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist

US4588670A · kind A · utility

Assignee

• American Hoechst Corporation · US

Inventors

• Michael G. Kelly · Thousand Oaks, US
• Donald Mammato · Lebanon, US
• Dana L. Durham · East Greenwich, US
• Sangya Jain · Bound Brook, US
• Lawrence N. Crane · Tustin, US

Key dates

• Filing date: Feb 28, 1985
• Grant date: May 13, 1986
• Expiry date: Feb 28, 2005

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/022
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A light sensitive composition for the preparation of a positive acting photoresist which is a mixture of an alkali soluble resin and a compound of the formula ##STR1## wherein X is a naphthoquinone-(1,2)-diazide-(2)-sulfonyl residue.