Interferometric wavefront measurement
US4594003A · kind A · utility
67Cited by
8References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 20, 1983 |
| Grant date | Jun 10, 1986 |
| Priority date | — |
| Expiry date | Jul 20, 2003 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B9/02057
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Apparatus is disclosed for the phase measurement of an interference pattern produced by an unequal path interferometer. The invention comprises in one embodiment the use of a diode laser light source whose wavelength is varied so that the phase difference between the two wavefronts producing the interference pattern is modulated by a known amount. The modulated interference pattern is photosensed with an imaging device, and the signals processed to provide a phase map representing the optical path difference between the reference and measurement wavefronts of the interferometer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.