Cathode sputtering apparatus with adjacently arranged stations
US4595483A · kind A · utility
11Cited by
8References
7Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 28, 1985 |
| Grant date | Jun 17, 1986 |
| Priority date | — |
| Expiry date | Mar 28, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
Cathode sputtering apparatus with at least two adjacently arranged stations including a charging station and a coating station. At least one sputtering cathode and a substrate carrier that can execute reciprocatory movement between the stations are arranged on a vacuum chamber. The substrate carrier is secured by means of an extension arm eccentrically on a pivot bearing passing through the vacuum chamber. A coolant circulation line is led through the pivot bearing to the substrate holder.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.