Method and apparatus for transport and processing of substrate with developing agent
US4600471A · kind A · utility
4Cited by
11References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 18, 1985 |
| Grant date | Jul 15, 1986 |
| Priority date | — |
| Expiry date | Jan 18, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67784
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Method of transporting and processing substrates with developing agent within a confined passage. Pressurized fluid medium is supplied and discharged on both sides of the substrate via sequentially located fluid medium supply and discharge channels intersecting the top and bottom of the passage, such that the moving fluid medium cushions the substrate and both sides of the substrate remain free of the passage. Developing agent is introduced via a developing agent supply channel intersecting the passage.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.