Cross-linked polyalkenyl phenol based photoresist compositions
US4600683A · kind A · utility
23Cited by
9References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 22, 1985 |
| Grant date | Jul 15, 1986 |
| Priority date | — |
| Expiry date | Apr 22, 2005 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/106
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A film forming, radiation sensitive resist composition having improved thermal stability and a reduced dissolution rate in developer solutions, comprised of a sensitizer and a polyalkenyl phenol such as a polyvinyl phenol cross-linked, prior to irradiation, with a poly-functional cross-linking agent such as dimethylol p-cresol or hexamethylene tetramine.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.