Uniform plasma for drill smear removal reactor
US4618477A · kind A · utility
10Cited by
10References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 17, 1985 |
| Grant date | Oct 21, 1986 |
| Priority date | — |
| Expiry date | Jan 17, 2005 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/095
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A system for generating a substantially uniform plasma for processing a substrate having two major surfaces. Each of the substrate major surfaces may have electrically conductive portions. Two electrodes are oppositely disposed with respect to one another on either side of the substrate. A first r.f. power source is electrically connected to the first electrode and a second r.f. power source is electrically connected to the second electrode. The first and second r.f. power sources are out of phase with respect to one another, resulting in the generation of a substantially uniform plasma field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.